AMAT 0041-75950 Cchemical Vapor Deposition Reactor REG670 Gross Weight: 2 kg

Gross Weight: 2 kg

ExnA IIC T4Gc X

Connection Type: 1 × RJ45 connector

Description: Digital Input Module with 32 inputs

AMAT 0041-75950 Cchemical Vapor Deposition Reactor REG670 Gross Weight: 2 kgDescription The AMAT 0041 75950 is a Chemical Vapor Deposition (CVD) reactor, designed as a temperature controlled heating or cooling reactor for thin film deposition. It is used to deposit conformal and uniform films on various substrates. The reactor consists of a reaction chamber enclosed in a vacuum sealed container, allowing precise thermal control and efficient material transfer. This equipment operates within a temperature range from room